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产品编号 CAS号 项目名称规格 分子式 加入购物车
I811584 12029-98-0 五氧化二碘, AR,98%
Iodine pentoxide, AR,98%
I2O5
F809696 16961-83-4 氟硅酸, AR,30.0-32.0%
Fluorosilicic acid solution, AR,30.0-32.0%
H2SiF6
P815378 12501-23-4 磷钨酸水合物, AR
Phosphotungstic acid, AR
H3O40PW12·xH2O
I811585 12029-98-0 五氧化二碘, 99.99% metals basis
Iodine pentoxide, 99.99% metals basis
I2O5
A801300 64-19-7 冰乙酸, 电子级,>99.7%
Acetate, 电子级,>99.7%
C2H4O2
S817424 10026-03-6 四氯化硒, 99.5%
Selenium tetrachloride, 99.5%
SeCl4
F809697 16961-83-4 氟硅酸, GR,30.0-32.0%
Fluorosilicic acid solution, GR,30.0-32.0%
H2SiF6
H811359 7664-39-3 氢氟酸, 电子级,49wt. % in H2O,99.99998%metals basis
Hydrofluoric acid, 电子级,49wt. % in H2O,99.99998%metals basis
HF
P816401 1310-58-3 氢氧化钾, 电子级,50%溶液
Potassium hydroxide, 电子级,50%溶液
KOH
A837038 氧化铝基片, 10x10x0.5mm, polished one side, A plane
Aluminum oxide substrate, 10x10x0.5mm, polished one side, A plane
A2O3
A837040 氧化铝基片, 10x10x0.5mm, polished one side, C plane
Aluminum oxide substrate, 10x10x0.5mm, polished one side, C plane
A2O3
A837041 氧化铝基片, 10x10x0.5mm, polished one side, M plane
Aluminum oxide substrate, 10x10x0.5mm, polished one side, M plane
A2O3
A837042 氧化铝基片, 10x10x0.5mm, polished one side, R plane
Aluminum oxide substrate, 10x10x0.5mm, polished one side, R plane
A2O3
A837044 氧化铝基片, 10x10x0.5mm, polished Two Sides, A Plane
Aluminum oxide substrate, 10x10x0.5mm, polished Two Sides, A Plane
A2O3
A837045 氧化铝基片, 10x10x0.5mm, polished Two side, C plane
Aluminum oxide substrate, 10x10x0.5mm, polished Two side, C plane
A2O3
A837047 氧化铝基片, 10x10x0.5mm, polished Two side, M plane
Aluminum oxide substrate, 10x10x0.5mm, polished Two side, M plane
A2O3
A837048 氧化铝基片, 10x10x0.5mm, polished Two side, R plane
Aluminum oxide substrate, 10x10x0.5mm, polished Two side, R plane
A2O3
S817581 7783-08-6 硒酸溶液, 40%水溶液
Selenic acid solution, 40%水溶液
H2SeO4
B802849 10043-35-3 硼酸, 99.99% metals basis
Boric acid, 99.99% metals basis
H3BO3
B802854 10043-35-3 硼酸, 99.998% metals basis
Boric acid, 99.998% metals basis
H3BO3
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